In the decade and a half since the publication of the Second
Edition of A User?s Guide to Vacuum Technology there have
been many important advances in the field, including spinning rotor
gauges, dry mechanical pumps, magnetically levitated turbo pumps,
and ultraclean system designs. These, along with improved cleaning
and assembly techniques have made contamination-free manufacturing
a reality. Designed to bridge the gap in both knowledge and
training between designers and end users of vacuum equipment, the
Third Edition offers a practical perspective on today?s vacuum
technology. With a focus on the operation, understanding, and
selection of equipment for industrial processes used in
semiconductor, optics, packaging, and related coating technologies,
A User?s Guide to Vacuum Technology, Third Edition provides
a detailed treatment of this important field. While emphasizing the
fundamentals and touching on significant topics not adequately
covered elsewhere, the text avoids topics not relevant to the
typical user.
Autorentext
JOHN F. O'HANLON, PHD, is Emeritus Professor of Electrical and Computer Engineering at the University of Arizona in Tucson.
Klappentext
The leading text in the field—fully updated to reflect changes in vacuum technology
In the decade and a half since the publication of the Second Edition of A User's Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today's vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User's Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.
The Third Edition features significant additions, including:
- Updated coverage of all topics
- A discussion of SI units and their conversion
- Expanded coverage of gauges, pumps, materials, components, and systems
- A discussion of ultraclean vacuum systems–now used routinely in high-volume production of semiconductor chips and related process-sensitive devices
- A review of rough pumping and crossover, including methods for prevention of aerosol formation
As with previous editions, the Third Edition is an important resource for both students and professionals in microelectronics, optics, thin-film coating, and other industries dependent on leading-edge applications of vacuum technology.
Zusammenfassung
In the decade and a half since the publication of the Second Edition of A User?s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today?s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User?s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.
Inhalt
Its Basis
1. Vacuum Technology 3
2. Gas Properties 9
3. Gas Flow 25
4. Gas Release from Solids 57
Measurements
5. Pressure Gauges 81
6. Flow Meters 109
7. Pumping Speed 123
8. Residual Gas Analyzers 133
9. Interpretation of RGA Data 161
Production
10. Mechanical Pumps 183
11. Turbomolecular Pumps 201
12. Diffusion Pumps 217
13. Pump Fluids 229
14. Getter and Ion Pumps 247
15. Cryogenic Pumps 263
Materials
16. Materials in Vacuum 289
17. Joints, Seals, and Valves 313
18. Lubrication 345
Systems
19. Rough Vacuum Pumping 359
20. High Vacuum Systems 379
21. Ultraclean Vacuum Systems 403
22. High Flow Systems 415
23. Multichamber Systems 431
24. Leak Detection 447
Symbols 459
Appendixes
A. Units and Constants 463
B. Gas Properties 466
C. Material Properties 478
D. Isotopic Abundances 488
E. Cracking Patterns 492
F. Pump Fluid Properties 498
Index 505