"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."

Saburo Nonogaki, Ueno Takumi, Toshio Ito

Exposure systems in photolithography; optical pattern transfer; chemistry of photoresist materials; practical processes in microlithography; X-ray lithography; electron-beam lithography; variations in microlithographic process.