Explores the impact of the latest breakthroughs in cluster SIMS technology Cluster secondary ion mass spectrometry (SIMS) is a high spatial resolution imaging mass spectrometry technique, which can be used to characterize the three-dimensional chemical structure in complex organic and molecular systems. It works by using a cluster ion source to sputter desorb material from a solid sample surface. Prior to the advent of the cluster source, SIMS was severely limited in its ability to characterize soft samples as a result of damage from the atomic source. Molecular samples were essentially destroyed during analysis, limiting the method's sensitivity and precluding compositional depth profiling. The use of new and emerging cluster ion beam technologies has all but eliminated these limitations, enabling researchers to enter into new fields once considered unattainable by the SIMS method. With contributions from leading mass spectrometry researchers around the world, Cluster Secondary Ion Mass Spectrometry: Principles and Applications describes the latest breakthroughs in instrumentation, and addresses best practices in cluster SIMS analysis. It serves as a compendium of knowledge on organic and polymeric surface and in-depth characterization using cluster ion beams. It covers topics ranging from the fundamentals and theory of cluster SIMS, to the important chemistries behind the success of the technique, as well as the wide-ranging applications of the technology. Examples of subjects covered include: Cluster SIMS theory and modeling Cluster ion source types and performance expectations Cluster ion beams for surface analysis experiments Molecular depth profiling and 3-D analysis with cluster ion beams Specialty applications ranging from biological samples analysis to semiconductors/metals analysis Future challenges and prospects for cluster SIMS This book is intended to benefit any scientist, ranging from beginning to advanced in level, with plenty of figures to help better understand complex concepts and processes. In addition, each chapter ends with a detailed reference set to the primary literature, facilitating further research into individual topics where desired. Cluster Secondary Ion Mass Spectrometry: Principles and Applications is a must-have read for any researcher in the surface analysis and/or imaging mass spectrometry fields.
Autorentext
Christine M. Mahoney, PhD, is a recognized expert and leader in the field of Secondary Ion Mass Spectrometry (SIMS). Throughout her career, she has focused primarily on the application of SIMS to molecular targets, and has played a significant role in the development of cluster SIMS for polymer depth profiling applications. She received her PhD in analytical chemistry from SUNY Buffalo in 1993. She spent the following eight years at the National Institute of Standards and Technology (NIST), where much of her molecular depth profiling work was performed. Christine is currently employed as a senior research scientist at the Environmental Molecular Sciences Laboratory (EMSL) at Pacific Northwest National Laboratory (PNNL), where she continues to lead research in the field of SIMS.
Inhalt
Contributors xi
About the Editor xiii
1 AN INTRODUCTION TO CLUSTER SECONDARY ION MASS SPECTROMETRY (CLUSTER SIMS) 1
Christine M. Mahoney and Greg Gillen
1.1 Secondary Ion Mass Spectrometry in a Nutshell 2
1.1.1 SIMS Imaging 4
1.1.2 SIMS Depth Profiling 4
1.2 Basic Cluster SIMS Theory 5
1.3 Cluster SIMS: An Early History 6
1.3.1 Nonlinear Sputter Yield Enhancements 6
1.3.2 Molecular Depth Profiling 7
1.4 Recent Developments 8
1.5 About this Book 9
Acknowledgment 11
References 11
2 CLUSTER SIMS OF ORGANIC MATERIALS: THEORETICAL INSIGHTS 13
Arnaud Delcorte, Oscar A. Restrepo, and Bartlomiej Czerwinski
2.1 Introduction 13
2.2 Molecular Dynamics Simulations of Sputtering with Clusters 15
2.2.1 The Cluster Effect 15
2.2.2 Computer Simulations and the Molecular Dynamics Experiment 18
2.2.3 Light and Heavy Element Clusters, and the Importance of Mass Matching 20
2.2.4 Structural Effects in Organic Materials 21
2.2.4.1 Amorphous Molecular Solids and Polymers 21
2.2.4.2 Organic Crystals 26
2.2.4.3 Thin Organic Layers on Metal Substrates 28
2.2.4.4 Hybrid MetalOrganic Samples 32
2.2.5 Induced Chemistry 34
2.2.6 Multiple Hits and Depth Profiling 36
2.2.7 From Small Polyatomic Projectiles to Massive Clusters 38
2.2.7.1 Light-Element Clusters 38
2.2.7.2 Large Argon Clusters 41
2.2.7.3 Massive Gold Clusters 45
2.3 Other Models 46
2.3.1 Analytical Models: From Linear Collision Cascades to Fluid Dynamics 46
2.3.2 Recent Developments and Hybrid Approaches 47
2.4 Conclusions 50
Acknowledgments 51
References 51
3 ION SOURCES USED FOR SECONDARY ION MASS SPECTROMETRY 57
Albert J. Fahey
3.1 Introduction 57
3.2 Research Needs that have Influenced the Development of Primary Ion Sources for Sputtering 58
3.3 Functional Aspects of Various Ion Sources 59
3.3.1 Energy Spread in the Beam 59
3.3.2 Point-Source Ionization 60
3.3.3 Stable Emission 60
3.3.4 Ion Reactivity 60
3.3.5 Source Lifetime 60
3.3.6 Penetration Depth and Surface Energy Spread of the Projectile 61
3.4 Atomic Ion Sources 61
3.4.1 Field Emission 61
3.4.2 Radio Frequency (RF) Ionization 62
3.4.3 Electron Impact 63
3.4.4 Thermal Ionization 64
3.4.5 DC-Glow Discharge 65
3.4.6 Sputtering 66
3.5 Molecular Ion Sources 66
3.5.1 Field Emission 66
3.5.2 Radio Frequency Discharge 67
3.5.3 Electron Impact 68
3.5.4 DC-Glow Discharge 69
3.5.5 Sputtering 69
3.6 Cluster Ion Sources 70
3.6.1 Jets and Electron Impact (Massive Gas Clusters) 71
3.6.2 Field Emission 72
3.7 Summary 73
References 74
4 SURFACE ANALYSIS OF ORGANIC MATERIALS WITH POLYATOMIC PRIMARY ION SOURCES 77
Christine M. Mahoney
4.1 Introduction 77
4.2 Cluster Sources in Static SIMS 78
4.2.1 A Brief Introduction to Static SIMS 78
4.2.2 Analysis beyond the Static Limit 79
4.2.3 Increased Ion Yields 80
4.2.4 Decreased Charging 81
4.2.5 Surface Cleaning 82
4.3 Experimental Considerations 83
4.3.1 When to Employ Cluster Sources as Opposed to Atomic Sources 83
4.3.2 Type of Cluster Source Used 84
4.3.2.1 Liquid Metal Ion Gun (LMIG) 84
4.3.2.2 C + 60 for Mass Spectral Analysis and Imaging Applications 85
4.3.2.3 The Gas Cluster Ion Beam (GCIB) 86
4.3.2.4 Au 4+ 400 86
4.3.2.5 Other Sources 88
4.3.3 Cluster Size Considerations 88
4.3.4 Beam Energy 90
4.3.5 Sample Temperature...